Our Mission

  • Provide world-class thin film research laboratory (hardware and software)  environment for innovation, product design, and learning. 

    • We are exploring a new way to revolutionarily reduce the research cost, and enhance the efficiency of thin film research.

    • We are building a bridge that leads directly to cutting-edge scientific research for professionals, amateurs, inventors, entrepreneurs, and anyone who wants to explore the science frontier research,to make a meaningful contribution to the world.

Proven High Invention Productivity

  • Dr. Ding was the former principal scientist led a group on energy saving window coating to develop the future products for the world's leading company (Guardian Industries) in this field.

  • Ding submitted 27 patent alerts per year during the year 2013-2016

  • 1/9 US approved patents in 2014 & 2015 in the field of building Low-E Glass Coating are Dr. Ding’s patents

  • A Judge of Santa Clara Valley Science & Engineering Fair 2017,2018

  • An Organizing Committee Member of  the  International Conference on Lasers and Optics 2018

  • Endorsed by industry company leaders and satisfied customers

Dr. Guowen Ding

 
  • EDUCATION

         Post-Doc    Chemical Engineering             UCLA  

         Ph. D.         Electrical Engineering,            University of Wisconsin-Madison  

         M.S.           Chemistry,                               Chinese Academy of Sciences  

         B. E.           Electronic Engineering,          Tsing-Hua University  

 

  • WORK EXPERIENCES:

  • Applied Materials (2000-2010), the largest semiconductor equipment company,

  • Intermolecular Inc (2010-2017), a former principal scientist who led a research group on energy-saving window coating to develop the future products for the world leading company in this field (Guardian Industries), and achieved several world-class proto-type products on energy-saving window coating, 

    • Dr. Ding led a research group on energy saving glass coating research

    • Dr. Ding Submitted a patent invention alert every two weeks from 2013 to 2015

      • 11.5% US total patents granted in this industry at year 2014 and 2015 was Dr. Ding’s patents. (According to WIPO (word intellectual property organization) https://patentscope.wipo.int/search/en/result.jsf, by searching: “‘low-E’, ‘glass’, ‘building’ in these two years in US. )

  • Labforinvention Corp (2017- present), Founder and CTO, provides world-class thin film research laboratory (hardware and software) environment for thin film service, research, innovation, product design, and learning

. ​

  • Journal paper, Chapter in book and conference presentation:

  1. G. Ding, C. Clavero, “Silver-Based Low-Emissivity Coating Technology for Energy-Saving Window Applications” chapter in book “Modern Technologies for Creating the Thin-film Systems and Coatings” 2017 March. publisher: Intech. chapter 20.

  2. G. Ding, C. Clavero, D. Schweigert, M. Le, “Thickness and microstructure effects in the optical and electrical properties of silver thin films” American Institute of Physics  ADVANCES, Volume: 5   Issue: 11  Article Number: 117234, NOV 2015

  3. Guowen Ding, Wei-Te Wu, Steve Mak, and Wai-Fan Yau, “Quick estimation of physical etching of SiO2 among etchers with decoupled plasma sources”, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21, 577 (2003)

  4. G. Ding, J. Scharer, and K. Kelly, “Effects of rapidly decaying plasmas on Electric probe measurements,” Journal of Applied Physics, 84(3)  (1998) 1236.

  5. K. Kelly, J. Scharer, G. Ding and M. Bettenhausen, “Microwave Reflections from a Vacuum Ultra-Violet Laser Produced Plasma Sheet,” Journal of Applied Physics 85(1)  (1999) 63.

  6. G. Ding, W. Sun et al. “Effects of Reagent Orbital Alignment on Product Vibrational Distributions of the Chemiluminescent Reaction Ca(1P1) +CH3I,” Chemical Physics Letters  265  (1997) 392.

  7. W. Yang, G. Ding et al. “Product rotational alignment of Orbital Aligned Ca(1P1) with CnH2n+1Br (n=1,2,3) Reactions,” Progress in Natural Science  6  (1996) 293.

  8. W. Yang, G. Ding, et al. “The Chemiluminescent Studies of the Orbital Aligned Ca(1P1) with CH4-nCln (n=1,2,3,4) Reactions,” Chemical Physics  193  (1995) 345.

  9. G. Ding, W. Yang et al.  “The Product Polarization of Chemiluminescent Reactions of Orbital Aligned Ca(1P1) with CH3I and C2H3I,”  Chemical Physics Letters 220 (1994) 1.

  10. W. Yang, G. Ding, et al. “The Studies of laser excited Ca(1P1) with chloromethane series,” Science in China,   25(4) (1995) 358. 

  11. G. Ding, W. Sun et al  “Reagent Orbital Alignment Effect in Chemiluminescence Reactions Ca(1P1) + CH3X (X=Cl, I),” Molecular Physics. 96(9) (1999) 1349

  12. J. Scharer, G. Ding et al. “Laser and radio-frequency production of seeded air plasmas,” American Institute of Aeronautics and Astronautics Paper 99-3668, (1999)

  13. V. J. Tu, J. Y. Jeong, A. Schutze, S. E. Babayan, G. S. Selwyn, G. Ding and R. F. Hicks, “Tantalum etching with a non-thermal atmospheric-pressure plasma”, Journal of Vacuum Science and Technology A, volume 18(6), (2000) page 2799

  14. J. Jeong, J. Park, I. Henins, S. E. Babayan, V. J. Tu, G. S. Selwyn, G. Ding and R. F. Hicks, “Reaction Chemistry in the Afterglow of an Oxygen-Helium, Atmospheric-Pressure Plasma”, Journal of Physical chemistry, volume 104, (2000), page 8027

  15. G. Ding, J. Scharer and K. Kelly, “Diagnostics and Analyses of Decay Process in Laser-Produced tetrakis(dimethy-amino)ethylene Plasma”,  Plasma of Physics volume 8(1), (2001), page 334.

  16.  S. E. Babayan, G. Ding and R. F. Hicks, “ Determining Nitrogen Atom Density In The Afterglow Of An Nitrogen Atmospheric-Pressure Plasma”, Plasma Chemistry And Plasma Processing, December 2001, Volume 21, Issue 4, pp 505–521

  17. S. E. Babayan, G. Ding, G. Nowling, X. Yang and R. F. Hicks, “Characterization of the Active Species in the Afterglow of a Nitrogen and Helium Atmospheric Pressure Plasma”, Plasma Chemistry And Plasma Processing, June 2002, Volume 22, Issue 2, pp 255–269

  18.  J. Scharer, K. Kelly, G. Ding, et al., “VUV laser plasma formation and microwave agile mirror/absorber,” IEEE International Conference on Plasma Science,  (1996), page 188.

  19.  K. Kelly, J. Scharer, G. Ding, et al. “Microwave reflections from a VUV laser produced plasma sheet”, IEEE International Conference on Plasma Science,  (1996), page 261.

  20. G. Ding, D. Xu and G. He, “Effect of the atomic orbital alignment on the chemiluminescent reactions Ca(1P1) with CH3X (X=Cl, I),” 213th ACS National Meeting, San Francisco, 1997, Abstracts of papers of the American Chemical Society,  V213, page 450.

  21. K. Kelly, J. Scharer, G. Ding, et al. “Microwave Reflections from a VUV Laser produced Plasma Sheet”, American Physics Society, Division of Plasma Physics Meeting, Pittsburgh, (1996), 9Q.29.

  22. J. Scharer, K. Kelly, G. Ding, M. Bettenhausen, “VUV laser plasma formation and microwave agile mirror/absorber”, IEEE International Conference on Plasma Science, (1997), page 156.

  23. G. Ding, J. Scharer and K. Kelly, “Dynamics of a laser produced plasma and its properties for microwave reflection”, IEEE International Conference on Plasma Science,  (1997), page133.

  24. K. Kelly, J. Scharer, G. Ding and M. Bettenhausen “Microwave Scattering Measurement from a Laser Produced Plasma Sheet”, American Physics Society, Division of Plasma Physics Meeting, Pittsburgh, (1997), bMoaP1.22.

  25. G. Ding, J. Scharer, and K. Kelly,  “Fast Langmuir probe measurements in a laser produced plasma,” Gaseous Electronics Conference, Madison, (1997), OWP4.

  26. J. Scharer, M. Bettenhausen, G. Ding, et al., “Laser and Radiofrequency Air Plasma Sources”, IEEE International Conference on Plasma Science,  (1998), page 302.

  27. K. Kelly, J. Scharer, G. Ding, et al. “Microwave Reflection from a VUV Laser Produced Plasma sheet,” IEEE International Conference on Plasma Science, (1997), page 134.

  28. G. Ding, J. Scharer, and K. Kelly, “Laser-produced TMAE plasma in Nitrogen, Oxygen, and Air,” IEEE International Conference on Plasma Science,  (1998), page 274.

  29. K. Kelly, J. Scharer, and G. Ding,  “Microwave Reflection from a VUV Laser Produced Plasma sheet”, IEEE International Conference on Plasma Science, (1998), page 275.

  30. J. Scharer, M. Bettenhausen, G. Ding, et al., “Laser and Radiofrequency Tailored Gas Plasma Sources,” IEEE International Conference on Plasma Science,  (1998), page 240.

  31. J. Scharer, G. Ding, H. Gui, et al., “Laser and Radiofrequency Air Plasma Sources”, American Physics Society, Division of Plasma Physics Meeting, New Orleans, (1998), J5P.08.

  32. G. Ding, J. Scharer and K. Kelly, “Nitrogen Influences on a Laser Produced TMAE Plasma”, IEEE International Conference on Plasma Science, Monterey, (1999), 4P03.

  33. K. Kelly, J. Scharer, G. Ding, “A Laser-Produced Plasma Sustained by a Radiofrequency Source”, IEEE International Conference on Plasma Science, Monterey,  (1999). 4P04.

  34. J. Scharer, G. Ding, X. Guo et al. “Laser and Radio-frequency wave Creation of Seeded Air Plasmas”, IEEE International Conference on Plasma Science, Monterey,  (1999). 2B06.

  35. K. Kelly, J. Scharer, G. Ding, et al. “Radio-frequency Sustainment of a Laser-Produced Plasma”, IEEE International Conference on Plasma Science, Monterey,  (1999). 2B05.

  36. G. Ding, J. Scharer, and K. Kelly, “Properties of Laser Produced TMAE Plasma Admixed with Air Constitutes, Nitrogen and Noble Gases.” Gaseous Electronics Conference, Norfolk,  Bulletin of The American Physical Society, Vol. 44(4), page 48, (1999)

  37. J. Scharer, G. Ding, H. Gui, K. Kelly and E. Paller, “Laser and Radiofrequency Production of Seeded air Plasmas”, Gaseous Electronics Conference, Norfolk, Bulletin of The American Physical Society, Vol. 44(4), page74, (1999)  

  38.  G. Ding, J. E. Scharer, R. Cao, K. L. Kelly, “Diagnostic and analyses of a laser-produced organic vapor plasma”, IEEE International Conference on Plasma Science, Piscataway,  (2000), P112.

  39. K.L.Kelly, J.E. Scharer, G. Ding, E. Paller and R. Cao, “Laser-produced plasma sustained by a radiofrequency sour”, IEEE International Conference on Plasma Science, Piscataway,  (2000), P113.

  40. E.S. Paller, J.E. Scharer, K.L Kelly, and G. Ding, “Argon and air mixture plasmas produced by a radiofrequency plasma source”, IEEE International Conference on Plasma Science, Piscataway,  (2000), P113.

  41. G. Ding, S.E. Babayan, G. Nowling, and R.F. Hicks, “Characterization of the Reactive Species in an Atmospheric-Pressure Nitrogen Plasma”, American Vacuum Society Symposium, Boston, 2000, TF-TuP38

  42. K. Kelly, J. Scharer, R. Cao, G. Ding, E. Paller “Laser Initiation and Radiofrequency Sustainment of Seeded Air Plasmas”, 42nd Annual Meeting of the APS (American Physics Society) Division of Plasma Physics combined with the 10th International Congress on Plasma Physics, October 23 - 27, 2000, Québec City, Canada, GP1.003.

  43. G. Ding, S.E. Babayan, G. Nowling, and R.F. Hicks,  “Determination of the Reactive Species in an Atmospheric-Pressure Nitrogen Plasma” , American Institute of Chemical Engineers Annual Meeting, November 12-17, 2000, Los Angeles, 210g

  44. Guowen Ding, Benjamin Schwarz, Changhun Lee, “Extension of Aluminum etch using a carbon mask for high aspect ratio 70nm Al etch with a chlorine-based chemistry.”, AVS 56th international Symposium, 2016, Nov 10-12, San Jose, CA.

  45. G. Ding, Y. Wang, J. Cheng, D. Schweigert, Z. Sun, M. Le, “Quick Estimation of Deposition Rate for a Sputter System”,  AVS 59th Annual International Symposium and Exhibition, PS-ThP10, Tampa, FL, October 28-November 2, 2012

  46. G. DING, M. LE, F. HASSAN, Z. SUN, M. NGUYEN , “Ellipsometry Study of a Reactively Sputtered Transparent Conductive Oxide(TCO), 39th ICMCTF (INTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS & THIN FILMS), April 23–27, 2012, San Diego, California, USA

  47. G. Ding, Y. Wang, Z. Sun, and M. Le, "Thin Silver Refractive Index Calculation from Ellipsometry and Resistivity," in Optical Interference Coatings, M. Tilsch, and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper ThC.5.

  48. Minh Le, Guowen Ding, Daniel Schweigert, Yong Li, Yiwei Lu, Philip Lingle & Muhammad Imran, “Combinatorial Optimization of Nanoscale Film Stacks for Low-E Glass Coatings” GPD Glass Performance Days Finland 2013 - Conference Proceedings 13-15 June, Tampere, Finland

  49. Guowen Ding, “High Productivity Combinatorial (HPC™) Platforms to Accelerate R&D on Glass Coating”, The 25th China International Glass Industrial Technical Exhibition (China Glass 2014), Shanghai, China.

  50. Guowen Ding and Minh Le, “Review of Low emissivity (low-E) coating technologies for Energy saving window applications”, 36th, NCCAVS - Symposia & Exhibitions, San Jose, CA, Feb. 2015

  51. Guowen Ding, César Clavero, Daniel Schweigert, “A new Constant of product of electronic scattering time and resistivity in Thin Silver Refractive Index Calculation from Ellipsometry and Resistivity measurements” AVS 63rd International Symposium, 2016, Nov 6-11, Nashville, TN

  52. Guowen Ding, “High throughput experimentation (HTE) Platforms to Accelerate R&D on Glass Coating”, 2017 Chinese Glass Industry Annual Conference, Hangzhou, China, April 2017

  53. Xiyue Zhou, Yucen Liu and Guowen Ding, “A New Conductive Material for Energy Efficient Window Applications” 14th International Conference and Exhibition on Materials Science and Engineering,  November 13-15, 2017,  Las Vegas, Nevada, USA

  54. Guowen Ding and Thomas Lu,“ Simulations and experiments on Ag-Ti alloy optical properties and its window coating application” 8th International Conference and Exhibition on Lasers, Optics & Photonics, Nov 15-17, 2017 Las Vegas, Nevada, USA

  55. Guowen Ding, “A new materials innovation methodology in thin film optical coating applications”, 39th, NCCAVS - Symposia & Exhibitions, san Jose, CA , Feb. 2015

  • Patents publications:  (double click will link to the original documents)

patent/publications #       Title

1                  7,320,942

Method for removal of metallic residue after plasma etching of a metal layer

2                  8,101,025

Method for controlling corrosion of a substrate

3                  8,298,849

Nitrogen reactive sputtering of Cu-In-Ga-N for solar cells

4                  8,394,659

Nitrogen reactive sputtering of Cu-In-Ga-N for solar cells

5                  8,435,419

Methods of processing substrates having metal materials

6                  8,557,615

TCO materials for solar applications

7                  8,665,511

Electrochromic device with improved transparent conductor and method for forming the same

8                  8,747,626

Method of generating high purity bismuth oxide

9                  8,778,514

Heat stable SnAl and SnMg based dielectrics

10                8,784,934

Heat stable SnAl and SnMg based dielectrics

11                8,900,423

Low refractive index material by sputtering deposition method

12                9,011,969

Low-E panel with improved dielectric layer and method for forming the same

13                9,013,782

Low-emissivity panels including magnetic layers

14                9,019,483

Method to extend single wavelength ellipsometer to obtain spectra of refractive index

15                9,045,363

Low-E panels with ternary metal oxide dielectric layer and method for forming the same

16                9,052,456

Low-E glazing performance by seed structure optimization

17                9,081,245

Electrochromic device with improved transparent conductor and method for forming the same

18                9,121,100

Silver based conductive layer for flexible electronics

19                9,127,348

Barrier layers for silver reflective coatings and HPC workflows for rapid screening of materials for such barrier layers

20                9,206,078

Barrier layers for silver reflective coatings and HPC workflows for rapid screening of materials for such barrier layers

21                9,279,910

Color shift of high LSG low emissivity coating after heat treatment

22                9,296,650

Low-E panels and methods for forming the same

23                9,296,651

Heat stable SnAl and SnMg based dielectrics

24                9,297,938

Methods and apparatuses for patterned low emissivity panels

25                9,309,149

Systems, methods, and apparatus for production coatings of low-emissivity glass

26                9,315,414

Low-e panels with ternary metal oxide dielectric layer and method for forming the same

27                9,321,676

Low-E glazing performance by seed structure optimization

28                9,365,450

Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance

29                9,394,198

Simplified protection layer for abrasion resistant glass coatings and methods for forming the same

30                9,405,046

High solar gain low-e panel and method for forming the same

31                9,408,303

Silver based conductive layer for flexible electronics

32                9,410,359

Low-e panels and methods for forming the same

33                9,416,049

Low-e panels and methods for forming the same

34                9,448,345

Silver barrier materials for low-emissivity applications

35                9,481,924

Seed layer for low-e applications

36                9,499,899

Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy

37                9,518,319

Low-emissivity glass including spacer layers compatible with heat treatment

38                20030219912

Method for removal of metallic residue after plasma etching of a metal layer

39                20040237997

Method for removal of residue from a substrate

40                20060137710

Method for controlling corrosion of a substrate

41                20090163033

METHODS FOR EXTENDING CHAMBER COMPONENT LIFE TIME

42                20100003828

METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS WITH A HIGHLY CONCENTRATED UNSATURATED HYDROCARBON GAS

43                20110303639

METHODS FOR PROCESSING SUBSTRATES HAVING METAL HARD MASKS

44                20110306215

METHODS OF PROCESSING SUBSTRATES HAVING METAL MATERIALS

45                20120094499

METHOD OF PERFORMING AN IN SITU CHAMBER CLEAN

46                20130122643

Nitrogen Reactive Sputtering of Cu-In-Ga-N for Solar Cells

47                20130136851

METHOD OF FORMING ATO WITH HIGH THROUGHPUT AND ELLIPSOMETRY DIAGNOSTIC METHOD FOR THE TCO PROCESS

48                20130136919

METHOD OF GENERATING HIGH PURITY BISMUTH OXIDE

49                20130136921

METHOD OF GENERATING HIGH PURITY BISMUTH OXIDE

50                20130136932

Heat Stable SnAl and SnMg Based Dielectrics

51                20130143354

TCO MATERIALS FOR SOLAR APPLICATIONS

52                20130163064

Electrochromic Device With Improved Transparent Conductor And Method For Forming The Same

53                20130164560

Low-E Panel With Improved Dielectric Layer And Method For Forming The Same

54                20130164561

Low-E Panels With Ternary Metal Oxide Dielectric Layer And Method For Forming The Same

55                20130189526

Heat Stable SnAl and SnMg Based Dielectrics

56                20130319847

METHODS AND APPARATUSES FOR LOW RESISTIVITY Ag THIN FILM USING COLLIMATED SPUTTERING

57                20140048013

SEED LAYER FOR ZnO AND DOPED-ZnO THIN FILM NUCLEATION AND METHODS OF SEED LAYER DEPOSITION

58                20140092462

Electrochromic Device with Improved Transparent Conductor and Method for Forming the Same

59                20140166472

Method and apparatus for temperature control to improve low emissivity coatings

60                20140168759

Methods and apparatuses for patterned low emissivity panels

61                20140170049

Low Refractive Index Material By Sputtering Deposition Method

62                20140170338

pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating

63                20140170413

Silver Based Conductive Layer For Flexible Electronics

64                20140170421

Low-E Panel with Improved Barrier Layer and Method for Forming the Same

65                20140170422

Low emissivity coating with optimal base layer material and layer stack

66                20140170434

Two Layer Ag Process For Low Emissivity Coatings

67                20140177042

Novel silver barrier materials for low-emissivity applications

68                20140178578

Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers

69                20140185034

Method to Extend Single Wavelength Ellipsometer to Obtain Spectra of Refractive Index

70                20140186598

Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance

71                20140268301

LOW-EMISSIVITY PANELS INCLUDING MAGNETIC LAYERS

72                20140268316

SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY

73                20140268317

High Solar Gain Low-E Panel and Method for Forming the Same

74                20140272335

Low-E Glazing Performance by Seed Structure Optimization

75                20140272353

Color shift of high LSG low emissivity coating after heat treatment

76                20140272354

Method to generate high LSG low-emissivity coating with same color after heat treatment

77                20140272390

Low-E Panel with Improved Barrier Layer Process Window and Method for Forming the Same

78                20140272395

LOW-EMISSIVITY GLASS INCLUDING SPACER LAYERS COMPATIBLE WITH HEAT TREATMENT

79                20140272454

Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers

80                20140272455

Titanium nickel niobium alloy barrier for low-emissivity coatings

81                20140287254

Heat Stable SnAl and SnMg Based Dielectrics

82                20140308528

SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS

83                20140322507

SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS

84                20150060910

Conductive Transparent Reflector

85                20150104569

Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers

86                20150158762

Simplified Protection Layer for Abrasion Resistant Glass Coatings and Methods for Forming the Same

87                20150162111

Transparent Conductive Films and Methods for Forming the Same

88                20150177583

SYSTEMS, METHODS, AND APPARATUS FOR INTEGRATED GLASS UNITS HAVING ADJUSTABLE SOLAR HEAT GAINS

89                20150177585

Systems, Methods, and Apparatus for Integrated Glass Units Having Adjustable Transmissivities

90                20150191815

Titanium nickel niobium alloy barrier for low-emissivity coatings

91                20150191965

Low-E Panels and Methods for Forming the Same

92                20150232376

Low-E Glazing Performance by Seed Structure Optimization

93                20150232378

Low-E Panels With Ternary Metal Oxide Dielectric Layer and Method For Forming The Same

94                20150327366

Silver Based Conductive Layer for Flexible Electronics

95                20150337432

Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers

96                20150345005

Seed layer for low-e applications

97                20150368152

Low-E Panels and Methods for Forming the Same

98                20160102013

Low-E Panels and Methods for Forming the Same

99                20160122235

Low-E Panels and Methods of Forming the Same

100             20170052297

SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY

101             WO2016149239 (A1)

TITANIUM NICKEL NIOBIUM ALLOY BARRIER FOR LOW-EMISSIVITY COATINGS

102             WO2015200050 (A1)

LOW-E PANELS AND METHODS FOR FORMING THE SAME

103             WO2014165202 (A1)

NEW DESIGN FOR IMPROVING COLOR SHIFT OF HIGH LSG LOW EMISSIVITY COATING AFTER HEAT TREATMENT

104             WO 2014164996 A1  

Improved low-e glazing performance by seed-structure optimization

105             WO2014164989 (A1)

PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS SYSTEMS

106             WO2014164983 (A1)

AN IMPROVED CONDUCTIVE TRANSPARENT REFLECTOR

107             WO2014164978 (A1) 

TITANIUM NICKEL NIOBIUM ALLOY BARRIER FOR LOW-EMISSIVITY COATINGS

108             WO 2014160414 A1  

Low-emissivity glass including spacer dielectric layers compatible with heat treatment

109             WO 2014160357 A1  

Color shift improvement after heat treatment

110             WO2014159699A1

Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers

111             WO 2014159670 A1  

SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS 

112             WO2014159653 (A1)

IMPROVED HIGH SOLAR GAIN LOW-E PANEL AND METHOD FOR FORMING THE SAME

113             WO 2014159640 A1  

METHOD TO GENERATE HIGH LSG LOW-EMISSIVITY COATING WITH SAME COLOR AFTER HEAT TREATMENT 

114             WO 2014159553 A1  

TERNARY ALLOY PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS  

115             WO 2014159429 A1  

LOW-EMISSIVITY TEMPERED GLASS INCLUDING SPACER LAYER

116             WO2014151446 (A3)

LOW-E PANEL WITH IMPROVED BARRIER LAYER PROCESS WINDOW AND METHOD FOR FORMING THE SAME

117             WO2014093779 (A1)  

IMPROVED LOW EMISSIVITY COATING WITH OPTIMAL BASE LAYER MATERIAL AND LAYER STACK

118             WO 2014093766 A1  

IMPROVED SILVER BASED CONDUCTIVE LAYER FOR FLEXIBLE ELECTRONICS  

119             WO 2014028283 A3  

SEED LAYER FOR ZnO AND DOPED-ZnO THIN FILM NUCLEATION AND METHODS OF SEED LAYER DEPOSITION

120             WO 2013101338 A1  

LOW-E PANELS WITH TERNARY METAL OXIDE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME 

121             JP2009135498 (A)

METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS

122             CN101030531 (A)

Method for controlling corrosion of a substrate

123             CN101452881 (A)

METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS

124             CN104995149 (A

IMPROVED LOW EMISSIVITY COATING WITH OPTIMAL BASE LAYER MATERIAL AND LAYER STACK

125             CN105431392 (A)

Electrically insulating material for thermal sprayed coatings

126             CN1574203 (A)

Method for removal of residue from a substrate

127             EP2065923 (A3)

METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS

128             KR101046818 (B1)

METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS

129             KR20040102337 (A)

METHOD OF REMOVING RESIDUES FROM SUBSTRATE USING HYDROGEN BASED PLASMA 

130             KR20070089082 (A) 

Method for controlling corrosion of a substrate

131             KR20150141928 (A)

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